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Selected unit for thin-film barrier development platform
July 4, 2013
By: DAVID SAVASTANO
Editor, Ink World Magazine
The Centre for Process Innovation (CPI), has selected Beneq’s roll-to-roll ALD unit for its thin-film barrier development platform. Beneq is a leading ALD equipment supplier that has been developing roll-to-roll ALD based on spatial atomic layer deposition (ALD) since 2008. The equipment will be delivered to CPI in England in Q2 of 2014. Beneq has signed an agreement with CPI to deliver roll-to-roll (R2R) ALD equipment to CPI’s NETPark facilities in Sedgefield in North East England. Beneq was...
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